Enabling the next generation of advanced chip manufacturing
We develop next-generation EUV photoresists that enhance throughput, improve cost of ownership, reduce stochastic variability, and support manufacturable scaling.
EUV lithography brings about many new materials challenges
Photoresist materials are a critical enabler of EUV lithography adoption. At EUV wavelengths, the interaction between light and matter occurs at near molecular scale, and small variations in material response directly impact pattern fidelity, yield, and cost of ownership.
EUV introduces a unique set of constraints, including a sparse photon source, narrow process windows, high cost of ownership, narrow depth-of-focus and complex photon-material interactions. Conventional resists demonstrate insufficient EUV absorption and excessive chemical diffusion leading to poor manufacturability.
If EUV is going to scale reliably and economically, photoresist materials must do more than resolve fine features. They must behave in a controlled and predictable way under extreme exposure conditions.
That is the problem we focus on.
Photoresists are a key enabler for high volume EUV manufacturing
EUV manufacturing tools are among the most complex and expensive machines ever built. Their performance depends not just on advanced hardware, optics and software, but on how consistently materials respond during every exposure.
When materials are unpredictable, throughput drops, defects rise, and scaling becomes limited. When materials are engineered for optimized control, those same tools become reliable, high-volume production systems.
High performance photoresists enable:
Higher tool utilization from the same EUV scanners
More stable yield as dimensions shrink
Cleaner pattern transfer with fewer defects
A practical path to future scaling, including high-NA EUV
A new solution approach brings new opportunities
Irresistible Materials develops purpose-built EUV photoresists designed to address the requirements of advanced lithography. At the core of our work is the patented Multi-Trigger Resist (MTR™) platform, which uses advanced chemical approaches to suppress unwanted reactions and deliver more reliable pattern formation under EUV exposure.
A decade of cutting edge materials innovation with a history of proven business success
Irresistible Materials was founded to tackle the toughest materials challenges in semiconductor manufacturing, combining deep materials science expertise with real-world manufacturing experience. For over a decade, we have developed technologies designed to move from research to manufacturing in close collaboration with leading industry partners.
Focused on advanced patterning materials since day one
Founded in 2010, Irresistible Materials has spent over a decade developing purpose-built materials for the most demanding lithography and patterning challenges. Its R&D team is a multi-disciplinary team with deep technical know-how and hands-on lithography process experience.
Seasoned market leadership across the semiconductor industry
Our leadership team brings experience from companies like ASML, Intel, and Lam Research and multiple innovative startups with a proven track record of success in taking advanced technologies to market and driving strong customer adoption.
Let's talk about your needs.
We stand ready to work with chip manufacturers and foundries ready to move beyond conventional resist solutions.